{"id":96,"date":"2013-01-14T09:51:57","date_gmt":"2013-01-14T09:51:57","guid":{"rendered":"http:\/\/alpsitec-cmp.com\/en\/?page_id=96"},"modified":"2013-01-14T10:48:31","modified_gmt":"2013-01-14T10:48:31","slug":"pcox-200s-technical-file","status":"publish","type":"page","link":"https:\/\/alpsitec-cmp.com\/en\/pcox-200s-technical-file\/","title":{"rendered":"Pcox 200s data sheet"},"content":{"rendered":"\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n
Rack<\/th>\n<\/tr>\n
Wafer diameter<\/td>\n<= 200 mm<\/td>\n<\/tr>\n
Rotation speed<\/td>\n15 – 150 rpm<\/td>\n<\/tr>\n
Back pressure<\/td>\n0 – 100 kPa<\/td>\n<\/tr>\n
Pressing force<\/td>\n0 – 3000 N<\/td>\n<\/tr>\n
Scan amplitude<\/td>\n0 – maximum<\/td>\n<\/tr>\n
Scan speed<\/td>\n0 – 0.35 m\/s<\/td>\n<\/tr>\n
<\/td>\n<\/td>\n<\/tr>\n
Tray<\/th>\n<\/tr>\n
Diameter<\/td>\n550 mm<\/td>\n<\/tr>\n
Rotation speed<\/td>\n15 – 150 rpm<\/td>\n<\/tr>\n
Temperature<\/td>\n10 – 60\u00b0C<\/td>\n<\/tr>\n
Abrasive<\/td>\n0 – 250 ml\/min<\/td>\n<\/tr>\n
Conditioner<\/th>\n<\/tr>\n
Tool type<\/td>\nbrush, disc, diamond ring<\/td>\n<\/tr>\n
Tool diameter<\/td>\n100 – 225 mm<\/td>\n<\/tr>\n
Force<\/td>\n20 \u2013 300 N<\/td>\n<\/tr>\n
Rotation speed<\/td>\n10 \u2013 70 rpm<\/td>\n<\/tr>\n
Scan speed<\/td>\n0 \u2013 0.9 m\/s<\/td>\n<\/tr>\n
End point<\/th>\n<\/tr>\n
Module prepared for interfacing with a system for detecting the end of attack<\/td>\nDFA2<\/sub> system from Alpsitec or other system.<\/td>\n<\/tr>\n
Power<\/th>\n<\/tr>\n
Head motor<\/td>\n0.75 kW<\/td>\n<\/tr>\n
Platen motor<\/td>\n2.20 kW<\/td>\n<\/tr>\n
Conditioning motor<\/td>\n0.37 kW<\/td>\n<\/tr>\n
Facilities<\/th>\n<\/tr>\n
Voltage<\/td>\n220V Tri or 400V tri<\/td>\n<\/tr>\n
Compressed air<\/td>\n6 bars<\/td>\n<\/tr>\n
Nitrogen<\/td>\n2 bars<\/td>\n<\/tr>\n
DI water<\/td>\n1 bar<\/td>\n<\/tr>\n
Consumption<\/th>\n<\/tr>\n
Electricity<\/td>\n1 – 2 KWH<\/td>\n<\/tr>\n
DI water<\/td>\n100 L\/hour<\/td>\n<\/tr>\n
Vaccum<\/td>\ninternal vacuum pump<\/td>\n<\/tr>\n
Dimensions<\/th>\n<\/tr>\n
Width<\/td>\n950 mm<\/td>\n<\/tr>\n
Depth<\/td>\n1190 mm<\/td>\n<\/tr>\n
Height<\/td>\n2480 mm<\/td>\n<\/tr>\n
Weight<\/td>\n1000 kg<\/td>\n<\/tr>\n
Wafer dimension<\/td>\n4\u2019\u2019 to 200 mm<\/td>\n<\/tr>\n
Retrofit kit<\/td>\n4″, 5″, 6″<\/td>\n<\/tr>\n
Option<\/strong><\/td>\nmodule autoloading cassette 1<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

These characteristics may be modified depending on the evolution of equipment.<\/p><\/blockquote>\n","protected":false},"excerpt":{"rendered":"

Rack Wafer diameter <= 200 mm Rotation speed 15 – 150 rpm Back pressure 0 – 100 kPa Pressing force…<\/p>\n","protected":false},"author":2,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"open","ping_status":"open","template":"","meta":[],"aioseo_notices":[],"aioseo_head":"\n\t\t\n\t\n\t\n\t\n\t\n\t\t\n\t\t\n\t\t\n\t\t\n\t\t\n\t\t\n\t\t\n\t\t\n\t\t\n\t\t\n\t\t\n\t\t